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Derniers dépôts
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Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
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Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
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Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
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Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
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Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
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J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
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T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
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Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
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Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
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Nombre de documents
77
Nombre de notices
277
Mots-clés
Mott insulators
Carbon
Transmission electron microscopy
Aryl-diazonium salts
Adsorption
Nanotubes
Applications industrielles
Structure
Capacitance
Thin films
A3 Physical vapor deposition processes
B3 Solar cells
BOMBARDMENT
CaTiO3Pr^3^+
Non-volatile memory
Scanning electron microscopy
X-ray photoelectron spectroscopy
Spectroscopic ellipsometry
CHLORINE PLASMAS
Atomic force microscopy
C Photoelectron spectroscopy
Kirkendall effect
V2O3
Biofilms microbiens
AuCu alloy
B2 Semiconducting alloys
Physical vapor deposition
Aluminium nitride
NEXAFS
Low-pressure plasma processing
3 nm in size
CIGSe
Vanadium Sesquioxide
A1 Characterization
Atomic layer etching
Titanium dioxide
Magnetron sputtering
Biocapteurs
Chalcogenide
Copper
Alloying
Residual stress
Chalcogenides
Nanocomposite
A Thin films
Semiconductors
Films
Chemical and biological sensors
A-CNx
Chalcogenide glass
Amorphous
Chemical detection
B2 Semiconducting indium compounds
Colloidal solution
Thin film
Avalanche breakdown
Carbon Nanotube
CNTs’ collapse
B1 Inorganic compounds
Band alignment
Transfert d'énergie
Oxides
Bipolar resistive switching BRS
B2 Quaternary
Alzheimer's disease
Ablation laser
TiO2
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
B Chemical synthesis
Functionalization
Amyloid precursor
Ambipolar material
Carbon nitride
Biomasse
Sol-gel
A Chalcogenides
XPS
Optical properties
PECVD
Cathepsin
Sputtering
Carbon nanotubes
Selenization
Resistive switching
Band gap
Anatase
SF 6
Etching
AZO thin films
AlN
A Multilayers
X-ray diffraction
Bixbyite
Calcined clay
Plasmas froids
Plasma etching
TEM
CH4
Mott insulator
Buffer Couple