@article{sanchez:hal-00985449, TITLE = {{Effect of low RF bias potential on AlN films obtained by microwave plasma enhanced chemical vapor deposition}}, AUTHOR = {Sanchez, Gustavo and Tristant, Pascal and Dublanche-Tixier, Christelle and Tetard, Florent and Bologna, A.}, URL = {https://unilim.hal.science/hal-00985449}, JOURNAL = {{Surface and Coatings Technology}}, PUBLISHER = {{Elsevier}}, PAGES = {SCT-18981}, YEAR = {2013}, MONTH = Nov, DOI = {10.1016/j.surfcoat.2013.10}, HAL_ID = {hal-00985449}, HAL_VERSION = {v1}, }