Structural and microstructural investigation on solution precursor plasma sprayed copperdoped hydroxyapatite (Cu-HA) coatings with0, 3, 5 and 10 weight percent (wt.%) of Cu dopant concentration is presented. Scanning electron micrographs show no significant morphological changes at the surface and cross-section of the coatings as copper content increases. X-ray diffraction results show decreases in the HA phase content from 93% to 14% and degree of crystallinity form 94% to 85% along with the increase of impurity phases upon increasing the copper concentration. RAMAN and IR spectra depicted broadening and red-shifting of the phosphate bands due to the distortion of the HA structure induced by the insertion of the copper ions into the HA lattice. X-ray photoelectron spectroscopy results identified that the copper species incorporated in HA structure was Cu + and Cu 2+ ions. Incorporation of copper ions into HA was associated to an interstitial insertion along hexagonal channel of the HA structure which leads to the increase in the lattice a parameter and expansion of the unit cell volume observed in Rietveld refinement measurements. The insertion was induced by the dehydroxylation process of HA due to the high temperatures of the plasma jet. Furthermore, the dopant concentration limitation in order to maintain the dominance of HA phase in the coating is 5 wt.% of Cu.