Depositon of nanometric SiOxHyCz films at different substrate temperatures by an atmospheric pressure microwave plasma torch (TIA) : first steps towards self-assembled 3-dimensional nano-sensors - Université de Limoges Accéder directement au contenu
Communication Dans Un Congrès Année : 2011

Depositon of nanometric SiOxHyCz films at different substrate temperatures by an atmospheric pressure microwave plasma torch (TIA) : first steps towards self-assembled 3-dimensional nano-sensors

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hal-00944747 , version 1 (11-02-2014)

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  • HAL Id : hal-00944747 , version 1

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Xavier Landreau, B. Lanfant, Thérèse Merle-Méjean, G. Bouscarrat, Z. Bouchkour, et al.. Depositon of nanometric SiOxHyCz films at different substrate temperatures by an atmospheric pressure microwave plasma torch (TIA) : first steps towards self-assembled 3-dimensional nano-sensors. 19th Annual International Conference on Composites or Nano-Engeneering (ICCE-19), Jul 2011, Shanghaï, China. pp.747. ⟨hal-00944747⟩
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